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Thickness measurement on insulating silicon oxide layers on silicon structures with dielectric insulation

  • Linear and Angular Measurements
  • Published:
Measurement Techniques Aims and scope

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Literature cited

  1. N. F. Kovtonyuk and Yu. A. Kontsevoi, Parameter Measurement on Semiconductor Materials [in Russian], Metallurgiya, Moscow (1970).

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  4. S. I. Stolyarov et al., Izmer. Tekh., No. 2 (1977).

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Authors
  1. S. I. Stolyarov
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  2. V. M. Trokhin
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  3. N. M. Vinnikov
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  4. N. D. Vdovichenko
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  5. A. D. Usenko
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Additional information

Translated from Izmeritel'naya Tekhnika, No. 5, pp. 30–32, May, 1983.

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Stolyarov, S.I., Trokhin, V.M., Vinnikov, N.M. et al. Thickness measurement on insulating silicon oxide layers on silicon structures with dielectric insulation. Meas Tech 26, 360–363 (1983). https://doi.org/10.1007/BF01101299

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  • DOI: https://doi.org/10.1007/BF01101299

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