Abstract
High-resolution SIMS and TEM have been used to evaluate growth processes and interfacial segregation occurring in α-Al2O3 scales grown at 1200°C on β-NiAl containing zirconium or yttrium.18O/SIMS shows that the extent of aluminum diffusion occurring during α-Al2O3 growth is reduced by the presence of these alloying elements, which are seen by SIMS imaging as oxide particles within the scale. STEM/EDS of the same oxide scales show that zirconium and yttrium also segregated to the oxide-alloy interface to the extent, respectively, of ≈0.15 and ≈0.07 of a monolayer and to oxide grain boundaries (≈0.2 monolayer). The complementary information provided by SIMS, TEM, and STEM provides a better understanding of the role of “reactive elements” in modifying scale-growth processes.
Similar content being viewed by others
References
R. Prescott, D. F. Mitchell, G. I. Sproule, and M. J. Graham,Solid State Ionics,53, 229 (1992).
D. F. Mitchell, R. Prescott, M. J. Graham, and J. Doychak, Proc. 3rd Int. SAMPE Metals Conference, October 1992, Toronto, Canada, Vol. 3, p. M78, 1992.
R. Prescott, D. F. Mitchell, and M. J. Graham,Corrosion 50, 62 (1994).
R. Prescott, D. F. Mitchell, and M. J. Graham, Proc. 2nd Int. Conf. on Microscopy of Oxidation, March 1993, Cambridge, U.K., p. 455, 1993.
J. Doychak and M. Rühle,Oxid. Met. 31, 431 (1989).
M. Rühle, A. G. Evans, M. F. Ashby, and J. P. Hirth (eds.)proc. Int. Workshop on Metal-Ceramic Interfaces (Pergamon Press, Oxford, 1990).
M. Rühle, A. G. Evans, A. H. Heuer, and M. F. Ashby (eds.),Acta Metall. Mater. 40, Suppl. SI-S368, 1992.
M. Rühle, U. Salzberger, and E. Schumann, Proc. 2nd Int. Conf. on Microscopy of Oxidation, March 1993, Cambridge, U.K., p. 3, 1993.
A. Strecker, U. Salzberger, and J. Mayer,Practical Metall. 30, 482 (1993).
J. A. S. Ikeda, Y-M. Chiang, A. J. Garratt-Reed, and J. B. Vander Sande,J. Am. Ceram. Soc. 76, 2447 (1993).
B. A. Pint, A. J. Garratt-Reed, and L. W. Hobbs, Proc. 2nd Int. Conf. on Microscopy of Oxidation, March 1993, Cambridge, U.K., p. 463, 1993.
B. A. Pint, J. R. Martin, and L. W. Hobbs,Oxid. Met. 39, 167 (1993).
K. Przybylski, A. J. Garratt-Reed, and G. J. Yurek,J. Electrochem. Soc. 135, 509 (1988).
C. M. Cotell, G. J. Yurek, R. J. Hussey, D. F. Mitchell, and M. J. Graham,Oxid. Met. 34, 173 (1990).
B. Pieraggi and R. A. Rapp,J. Electrochem. Soc. 140, 2844 (1993).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Schumann, E., Yang, J.C., Rühle, M. et al. High-resolution SIMS and analytical TEM evaluation of alumina scales onβ-NiAl containing Zr or Y. Oxid Met 46, 37–49 (1996). https://doi.org/10.1007/BF01046883
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF01046883