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Further investigation on the thermal decomposition of aluminium dialkylamides

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Abstract

Both dimethylamino- (I) and diethylamino-alane dimers (II), [(R2N)2AlH]2 (I, R=Me; II, R=Et) decompose above 800° C under a few hundred Pa of hydrogen to dark greyish, hard (Vickers hardness larger than 2000), oxidation-resistive and oxidation-protective deposits which are tentatively identified as Al5C3N. The deposits are stable to moisture and diluted hydrochloric acid in contrast to those obtained below 800° C, but they easily dissolve in sodium hydroxide solution at room temperature evolving a gas. The deposits on a stainless steel substrate adhere strongly to the substrate and remain so on rapid heating and cooling. The electrical resistivity of the deposits is in the range 102 to 104 Ω cm.

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Authors and Affiliations

  1. Department of Synthetic Chemistry, Faculty of Engineering, Gifu University, 504, Kakamigahara, Japan

    Yasutaka Takahashi, Kenji Mutoh, Seiji Motojima & Kohzo Sugiyama

Authors
  1. Yasutaka Takahashi
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  2. Kenji Mutoh
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  3. Seiji Motojima
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  4. Kohzo Sugiyama
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Takahashi, Y., Mutoh, K., Motojima, S. et al. Further investigation on the thermal decomposition of aluminium dialkylamides. J Mater Sci 16, 1217–1222 (1981). https://doi.org/10.1007/BF01033835

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  • DOI: https://doi.org/10.1007/BF01033835

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