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Journal of Applied Electrochemistry

, Volume 22, Issue 3, pp 240–246 | Cite as

An experimental study of mass transfer in pulse reversal plating

  • J. Y. Wang
  • D. Balamurugan
  • D-T. Chin
Papers

Abstract

An experimental study has been made of the limiting pulse current density for a periodic pulse reversal plating of copper on a rotating disc electrode from an acidic copper sulfate bath containing 0.05m CuSO4 and 0.5M H2SO4. The measurements were made over a range of the electrode rotational speeds of 400–2500 r.p.m., pulse periods of 1–100 ms, cathodic duty cycles of 0.25–0.9, and dimension-less anodic pulse reversal current densities of 0 to 50. The experimental limiting pulse current data were compared to the theoretical prediction of Chin's mass transfer model. A satisfactory agreement was obtained over the range of a dimensionless pulse period ofDT/δ2=0.001−1; the root mean square deviation between the theory and 128 experimental data points was ±8.5%.

Keywords

Duty Cycle Copper Sulfate Disc Electrode Pulse Period Rotate Disc Electrode 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notation

Cb

bulk concentration of the diffusing ion (mol cm−3)

Cs

surface concentration of the diffusing ion (mol cm−3)

D

diffusivity of the diffusing ion (cm2 s−1)

F

Faraday's constant (96 500C equiv−1)

i

current density (A cm−2)

i1

cathodic pulse current density (A cm−2)

i3

anodic pulse reversal current density (A cm−2)

i3*

dimensionless anodic pulse reversal density defined asi3/✓ilim

ilim

cathodic d.c. limiting current density (A cm−2)

ilim, a

anodic d.c. limiting current density (A cm−2)

iPL

cathodic limiting pulse current density (A cm−2)

iPL*

dimensionless limiting pulse current density defined asiPL/ilim

m

dummy index in Equation 1

n

number of electrons transferred in the electrode reaction (equiv/mol)

l

time (s)

t1

cathodic pulse time (s)

i3

anodic pulse reversal time (s)

T

pulse period equal tot1+t3 (s)

T*

pulse period defined asDT/δ2 (dimensionless)

Greek letters

δ

thickness of the steady-state Nernst diffusion layer (cm)

ν

electrode potential (V)

νde

time-averaged electrode potential (V)

λm

eigenvalues given by Equation 2 (dimensionless)

θ1

cathodic duty cycle (dimensionless)

θ3

anodic duty cycle in pulse reversal plating (dimensionless)

ν

kinematic viscosity (cm2 s−1)

ω

electrode rotational speed (rad s−1)

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References

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Copyright information

© Chapman & Hall 1992

Authors and Affiliations

  • J. Y. Wang
    • 1
  • D. Balamurugan
    • 1
  • D-T. Chin
    • 1
  1. 1.Department of Chemical EngineeringClarkson UniversityPotsdamUSA

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