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The electrodeposition of chromium from chromium(III) solutions — a study using microelectrodes

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Abstract

Potential sweep and pulse experiments at a carbon microdisc electrode (radius 4 μm) have been used to investigate chromium plating from aqueous solutions of chromic ions containing sulphate or thiocyanate ions and buffered at pH 3.3. While chromium deposition occurs in many media, it is shown that the plating reaction is always in competition with other cathodic reactions including hydrogen evolution. This leads to loss in current effciency and, in some circumstances, to precipitation of chromic hydroxide on the cathode and, hence, contamination of the metal. In addition, it is demonstrated that the chromium(III) exists in solution as mixtures of complexes, not all of which are electroactive within the accessible potential range. Hence the investigation confirms that the quality of electroplates will vary strongly with the choice of medium. A commercial chromium(III) plating bath, Envirochrome, has also been studied and it is concluded that its properties are superior to simple sulphate or thiocyanate solutions.

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Authors and Affiliations

  1. Department of Chemistry, The University, S09 5NH, Southampton, UK

    J. N. Howarth & D. Pletcher

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  1. J. N. Howarth
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  2. D. Pletcher
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Howarth, J.N., Pletcher, D. The electrodeposition of chromium from chromium(III) solutions — a study using microelectrodes. J Appl Electrochem 18, 644–652 (1988). https://doi.org/10.1007/BF01022264

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  • DOI: https://doi.org/10.1007/BF01022264

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