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Journal of Applied Electrochemistry

, Volume 18, Issue 4, pp 555–560 | Cite as

Valve metal behaviour of bismuth in NaOH

  • A. A. Mazhar
  • F. El-Taib Heakal
  • M. A. Ameer
Papers

Abstract

Galvanostatic anodization of bismuth in different media indicates that the formation of the oxide film depends simultaneously on both pH and the anions present in the anodization medium. Dissolution of these films in NaOH supports this observation. The film is formed of two layers. Open circuit impedance and potential measurements in NaOH indicate film growth. The anodic film formed in NaOH dissolves, however, in NaOH solutions following a zero order mechanism. A number of factors including formation voltage, NaOH concentration, current density and temperature are investigated. The activation energy of the oxide film dissolution is calculated. It may be concluded that the outer layer, in addition to being of a more defective structure, is probably of a higher oxidation state than the inner layer.

Keywords

Activation Energy Bismuth Oxide Film High Oxidation Film Growth 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman and Hall Ltd. 1988

Authors and Affiliations

  • A. A. Mazhar
    • 1
  • F. El-Taib Heakal
    • 1
  • M. A. Ameer
    • 1
  1. 1.Chemistry Department, Faculty of ScienceCairo UniversityGizaEgypt

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