Hyperfine Interactions

, Volume 3, Issue 1, pp 297–314 | Cite as

Damage studies on the system\(^{111} \mathop {In}\limits^ \to \underline {Ni}\)

  • C. Hohenemser
  • A. R. Arends
  • H. de Waard
  • H. G. Devare
  • F. Pleiter
  • S. A. Drentje
Article

Abstract

Lattice damage after implantation of111In in Ni has been studied applying the DPAC technique to the 171–245 keV γ-ray cascade in the daughter nucleus111Cd. Implantations were carried out at 10 K and at 300 K. The low temperature implantation yields a higher regular substitutional fraction (80%) than the room temperature implantation (40%). The annealing behaviour of both implants above RT is the same. In addition, two distinct defect-associated sites were observed in isochronal annealing sequences. A microscopic model for these defects is presented, which takes into account magnetic and electric hyperfine interaction strengths, binding energies and site populations as a functions of temperature.

Keywords

Thin Film Hyperfine Interaction Interaction Strength Microscopic Model Isochronal Annealing 

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Copyright information

© North-Holland Publishing Company 1977

Authors and Affiliations

  • C. Hohenemser
    • 1
  • A. R. Arends
    • 1
  • H. de Waard
    • 1
  • H. G. Devare
    • 1
  • F. Pleiter
    • 1
  • S. A. Drentje
    • 1
  1. 1.Laboratorium voor Algemene NatuurkundeGroningenThe Netherlands

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