Plasma Chemistry and Plasma Processing

, Volume 9, Supplement 1, pp 29S–54S | Cite as

Preparation of inorganic materials, surface treatment, and etching in low pressure plasmas: Present status and future trends

  • S. Vepřek


The present status and future trends in the chemistry of nonisothermal plasmas of glow and dielectric barrier discharges are summarized. Particular attention is devoted to the surface treatment, plasma etching, and to the plasma-induced and-assisted chemical vapor deposition. Several open problems which deserve exploratory research are addressed.

Key Words

Plasma CVD plasma etching surface treatment nitriding ion implantation 


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Copyright information

© Plenum Publishing Corporation 1989

Authors and Affiliations

  • S. Vepřek
    • 1
  1. 1.Institute of Inorganic ChemistryUniversity of ZürichZürichSwitzerland

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