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Copper recovery from dilute solutions in the Falling-Film cell

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Abstract

The removal of copper from dilute solutions is examined in electrochemical reactors where the electrolyte flows as a thin film in an inclined channel between a plane plate and a sheet of expanded metal (Falling-Film cell). Copper is recovered as a thin sheet from the plane plate. The results are compared with a known simplified model and the variations of the faradaic yield with the operating conditions are discussed.

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Abbreviations

A e :

electrode surface area

b :

width of inclined channel

C(t) :

copper concentration at timet

C 0 :

initial copper concentration

d :

interelectrode distance

\(\bar i\) :

overall current density

\(\bar i_L \) :

overall limiting current density

\(\bar k_d \) :

overall mass transfer coefficient

L :

length of the channel

Q v :

volumetric flow rate

Q vl :

volumetric flow rate per unit of channel width (=Q v/b)

t :

time

t s :

residence time in the reactor, defined by Equation 1

\(\bar u_m \) :

mean flow velocity of the liquid film, defined by Equation 2

V :

volume of electrolyte in the circuit

V R :

reactor volume

v sn :

normalized space velocity, defined by Equation 9

α:

inclination angle with respect to the horizontal

ν:

instantaneous faradaic yield

\(\bar \eta (t)\) :

time-averaged faradaic yield

v e :

number of electrons exchanged in the electrochemical reaction

References

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Legrand, J., Marracino, J.M. & Coeuret, F. Copper recovery from dilute solutions in the Falling-Film cell. J Appl Electrochem 16, 365–373 (1986). https://doi.org/10.1007/BF01008846

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  • DOI: https://doi.org/10.1007/BF01008846

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