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A new method for the express monitoring of the dose and uniformity of ion implantation

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Measurement Techniques Aims and scope

Abstract

The proposed new original method for express monitoring differs from existing methods in that it is less tedious and does not require expensive apparatus. It may also be useful in aligning ion-beam equipment.

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Authors
  1. M. Ya. Lipkes
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  2. E. D. Martynova
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  3. V. V. Simonov
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Additional information

Translated from Izmeritel'naya Tekhnika, No. 12, pp. 45–47, December, 1993.

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Lipkes, M.Y., Martynova, E.D. & Simonov, V.V. A new method for the express monitoring of the dose and uniformity of ion implantation. Meas Tech 36, 1384–1387 (1993). https://doi.org/10.1007/BF00978269

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  • DOI: https://doi.org/10.1007/BF00978269

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