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The photopolymerisation of methacrylic acid by colloidal semiconductors

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Summary

Methacrylic acid was photopolymerised using CdS and composite, CdS/HgS and CdS/TiO2, colloidal semiconductor particles as initiators. The previously proposed photoinitiation mechanism involving the photogenerated positive hole in the valence band of the CdS colloid was confirmed by the electron scavenging action of TiO2. The effect of pH on the course of the polymerisation was investigated and is discussed.

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Authors and Affiliations

  1. Faculty of Technology and Metallurgy, Belgrade University, Karnegijeva 4, P.O. Box 494, 11001, Belgrade, Serbia

    Ivanka G. Popović & Lynne Katsikas

  2. Abteilung Kleinteilchenforschung, Hahn-Meitner-Institut Berlin GmbH, Glienickerstrasse 100, D-14109, Berlin, Germany

    Horst Weller

Authors
  1. Ivanka G. Popović
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  2. Lynne Katsikas
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  3. Horst Weller
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Popović, I.G., Katsikas, L. & Weller, H. The photopolymerisation of methacrylic acid by colloidal semiconductors. Polymer Bulletin 32, 597–603 (1994). https://doi.org/10.1007/BF00973907

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  • DOI: https://doi.org/10.1007/BF00973907

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