Abstract
The decomposition (70 eV, 17 eV) of Si2(OCH3)6, Si2(OCD3)6, and Si3(OCH3)8 by electron-impact is characterized by an initial loss of the radicals CH3, Si(OCH3)3, and OCH3. For the disilanes, a typical pathway follows by successive loss of formaldehyde forming SiH-units; in the trisilane the main fragmentation path shows elimination of dimethoxysilylene previous to CH2O-abstraction. Fragmentation schemes are given, in part metastable supported.
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Höfler, F. Der massenspektrometrische Zerfall von Hexamethoxydisilan und Oktamethoxytrisilan. Monatshefte für Chemie 106, 593–600 (1975). https://doi.org/10.1007/BF00902163
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DOI: https://doi.org/10.1007/BF00902163