Abstract
The root-mean-square dynamic displacements (\(\begin{array}{*{20}c} -- \\ {u^2 } \\ \end{array} _{dyn} \)) of silicon atoms in single-crystals doped with phosphorus, arsenic, antimony, boron, gallium, and indium are determined experimentally. Characteristic concentration dependences of\(\begin{array}{*{20}c} -- \\ {u^2 } \\ \end{array} _{dyn} \) are obtained for boron- and phosphorus-doped silicon. A number of experimental facts indicating the existence of electron-phonon interaction in comparison with results in the literature, which are the results of an investigation of the same phenomenon by other methods, is discussed.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 13–17, September, 1977.
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Kapustina, M.D., Panteleev, V.A. & Markova, T.Y. Influence of electron-phonon interaction in doped silicon crystals on the root-mean-square dynamic displacement of atoms. Soviet Physics Journal 20, 1128–1131 (1977). https://doi.org/10.1007/BF00897111
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DOI: https://doi.org/10.1007/BF00897111