Abstract
An hf discharge in CCl4, is studied by probe and optical emission spectroscopy. The experiments were performed in a diode type reactor in which a discharge was maintained at a frequency of 440 kHz. A measurement method based on simultaneous use of single and double probes is described. The plasma was studied spectrographically to identify radicals present in the CCl4 hf discharge.
Similar content being viewed by others
Literature cited
N. Ainspruk and D. Braun (eds.), Plasma Technology in VLSI Production [Russian translation], Mir, Moscow (1987).
V. A. Godyak and O. A. Popov, Zh. Tekh. Fiz.,47, No. 4, 766–771 (1977).
Yu. F. Nasedkin, G. B. Levandyi, A. A. Serov, et al., Teplofiz. Vys. Temp.,23, No. 1, 156–162 (1985).
S. Klagge and M. Tichy, Czech. J. Phys.,B35, No. 9, 988–1006 (1985).
H. Sabadil, S. Klagge, and M. Kammeyer, Plasma Chem. Plasma Process.,8, No. 4, 425–444 (1988).
J. W. Coburn and M. Chen, J. Appl. Phys.,51, No. 6, 3134–3136 (1980).
G. K. Vinogradov, D. I. Slovetskii, and T. V. Fedoseeva, Teplofiz. Vys. Temp.,22, No. 2, 225–232 (1984).
A. P. Avtjuschkov, V. A. Labunov, and A. F. Stekolnikov, Nucl. Instr. Methods Phys. Res.,B39, No. 1, 496–499 (1989).
Author information
Authors and Affiliations
Additional information
Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 5–8, September, 1990.
Rights and permissions
About this article
Cite this article
Avtyushkov, A.P. Parameters of an hf discharge in carbon tetrachloride. Soviet Physics Journal 33, 723–726 (1990). https://doi.org/10.1007/BF00894888
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF00894888