Soviet Physics Journal

, Volume 20, Issue 3, pp 354–358 | Cite as

The kinetics of liquid-phase epitaxy of moving-temperature-gradient zone refining

  • V. N. Lozovskii
  • V. P. Popov
  • I. P. Papkov


The authors analyze the dependence of the growth rate of layers during moving-temperaturegradient zone refining on the zone thickness, the process temperature, and the mechanism of atomic-kinetic processes at interfaces. The results of experimental investigations of the growth kinetics in the silicon-aluminum system are in agreement with theoretical analyses.


Growth Rate Experimental Investigation Theoretical Analysis Process Temperature Growth Kinetic 
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Literature cited

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    V. N. Lozovskii, V. P. Popov, and I. P. Papkov, Inventors' Certificate No. 338780, Byul. Izobret., No. 29 (1973).Google Scholar
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    V. N. Lozovskii, Temperature-Gradient Zone Refining [in Russian], Metallurgiya, Moscow (1972).Google Scholar
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    W. A. Tiller, J. Appl. Phys.,34, No. 9, 2754 (1963).Google Scholar
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    V. N. Lozovskii, N. F. Politova, and E. V. Shutova, Fiz. Met. Metalloved.,26, No. 2, 374 (1963).Google Scholar
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    S. A. Grinberg and E. I. Givargizov, Kristallografiya,18, 2, 380–384 (1973).Google Scholar

Copyright information

© Plenum Publishing Corporation 1978

Authors and Affiliations

  • V. N. Lozovskii
    • 1
  • V. P. Popov
    • 1
  • I. P. Papkov
    • 1
  1. 1.S. Ordzhonikidze Novocherkassk Polytechnic InstituteUSSR

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