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Moisture-resistance of SiO2 films

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Soviet Physics Journal Aims and scope

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Literature cited

  1. W. A. Pliskin, Proc. IEEE,52, No. 12, 1468–1471 (1964).

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  2. W. A. Pliskin, D. R. Kerr, and J. A. Perri, Physics of Thin Films [Russian translation], Mir, Moscow (1970).

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  3. N. I. Timofeeva, L. I. Drozdova, and V. A. Timofeev, Izv. Akad. Nauk SSSR, Ser. Neorgan. Mater.,6, 3 (1970).

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  4. G. A. Vorob'ev and T. I. Danilina, Izv. VUZ. Fiz., No. 6, 158–159 (1970).

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Authors and Affiliations

  1. Tomsk Institute of Automated Systems of Control and Radioelectronics, USSR

    T. I. Danilina, V. V. Motoshkin, V. A. Vedernikov & N. S. Mukhacheva

Authors
  1. T. I. Danilina
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  2. V. V. Motoshkin
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  3. V. A. Vedernikov
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  4. N. S. Mukhacheva
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Additional information

Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 7, pp. 125–127, July, 1972.

In conclusion, the authors wish to thank Professor G. A. Vorob'ev for his constant interest in the work and his valuable comments on the manuscript.

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Danilina, T.I., Motoshkin, V.V., Vedernikov, V.A. et al. Moisture-resistance of SiO2 films. Soviet Physics Journal 15, 1034–1035 (1972). https://doi.org/10.1007/BF00894695

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  • DOI: https://doi.org/10.1007/BF00894695

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