Abstract
The effect of magnetic fied on the annealing of silicon iron (∼3% Si) was studied in the temperature range 480–680°C. The imposition of a magnetic field at 480°C leads to more complete tempering by comparison with similar annealing without field. The effect of the magnetic field on the primary recrystallization texture of the silicon iron is shown: this is expressed in the enhanced scattering of deformation type orientations in the annealing texture.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 82–87, January, 1973.
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Markov, Y.N., Adamesku, R.A., Scryabin, D.A. et al. Effect of magnetic field on tempering processes in silicon iron. Soviet Physics Journal 16, 63–67 (1973). https://doi.org/10.1007/BF00893343
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DOI: https://doi.org/10.1007/BF00893343