Abstract
Kinetic (growth rate), optical, and electron-microscopic (surface relief) studies were made of the process of formation of homoepitaxial films of InAs in a chloride gas-transport system. It was found that the (111)A and B surfaces of indium arsenide and their vicinals grew by the step-layer mechanism, whereas the (001) surfaces and those inclined from them grew by the normal growth mechanism. Two types of defect were observed on the growth surface of homoepitaxial InAs films: a) defects nucleated on the substrate; b) humps formed on the surface during the final stage of the process.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 71–75, September, 1980.
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Aleksandrova, G.A., Ivonin, I.V., Krasil'nikova, L.M. et al. Investigation of anisotropic effects in vapor epitaxy of indium arsenide. I. Anistropy of growth rate and surface microrelief. Soviet Physics Journal 23, 813–817 (1980). https://doi.org/10.1007/BF00892532
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DOI: https://doi.org/10.1007/BF00892532