Conclusions
Thus, consideration of the temperature dependences of the growth rate of singular and vicinal GaAs faces made it possible to determine the activation energy of the growth process in the kinetic region, to demonstrate the changes in the activation energy on passing from singular to vicinal faces, to estimate the magnitude of these changes, and also to analyze some distinctive features of the crystallization process which are related to the crystal chemistry of growing planes. The growth of GaAs epitaxial layers near the <111>B and <001> poles over a wide range of deposition temperatures is limited by the rate of the surface stage while for layers grown on substrates near the <111>A and <110> poles at high temperatures a significant role is played by outward-diffusion limitations which are associated primarily with the arsenic supply.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii., Fizika, No. 9, pp. 101–104, September, 1982.
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Lavrent'eva, L.G., Ivanov, V.G., Ivonin, I.V. et al. Influence of crystallization temperature on growth rate of epitaxial gallium arsenide layers in the system GaAs-AsCl3-H2 . Soviet Physics Journal 25, 859–862 (1982). https://doi.org/10.1007/BF00892410
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DOI: https://doi.org/10.1007/BF00892410