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Mechanism of “healing” of defects in thin dielectric Ta2O5 films

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Literature cited

  1. P. J. Harrop and D. S. Campbell, in: L. I. Maissel and R. Glang (editors), Handbook of Thin Film Technology, McGraw-Hill, New York (1970).

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Authors and Affiliations

  1. Tomsk Institute of Automated Control Systems Radioelectronics, USSR

    V. V. Motoshkin, V. A. Mukhachev & A. A. Miller

Authors
  1. V. V. Motoshkin
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  2. V. A. Mukhachev
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  3. A. A. Miller
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Additional information

Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 6, pp. 96–98, June, 1979.

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Motoshkin, V.V., Mukhachev, V.A. & Miller, A.A. Mechanism of “healing” of defects in thin dielectric Ta2O5 films. Soviet Physics Journal 22, 651–653 (1979). https://doi.org/10.1007/BF00891562

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  • DOI: https://doi.org/10.1007/BF00891562

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