Abstract
This article shows that considering relaxation processes in the formation of the electrical image (the Schottky part of the work function is determined by the interaction of the emission electron with this image) leads to the photoelectric work function depending on the light frequency. It also turns out that the Schottky energy and the potential step at the boundary of the material in a double layer make independent contributions to the total work function and can be determined separately from its frequency dependence.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika No. 1, pp. 74–78, January, 1977.
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Iglamova, R.I., Izmailov, S.V. Dependence of the photoelectric work function on the light frequency. Soviet Physics Journal 20, 57–60 (1977). https://doi.org/10.1007/BF00891427
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DOI: https://doi.org/10.1007/BF00891427