Abstract
Treatment of zinc sulfide phosphors in atomic hydrogen not only produces radical-recombination luminescence (RRL) but also sputtering of the phosphor. The sputtering rate has been estimated for FKP-03k powder phosphor at various temperatures. The atomic hydrogen produces defects of etch-pit type on the surface of a single crystal. The long-term response of the RRL has been recorded for the FKP-03k phosphor and it is ascribed to the sputtering.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 3, pp. 107–110, March, 1975.
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Kornich, V.G., Pinchuk, V.P. & Gorban, A.N. Sputtering of zinc sulfide phosphors in excitation of radical-recombination luminescence by atomic hydrogen. Soviet Physics Journal 18, 382–384 (1975). https://doi.org/10.1007/BF00889305
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DOI: https://doi.org/10.1007/BF00889305