Abstract
Transition to single crystal of polycrystalline Si material underlying a Si crystal substrate of 〈100〉 orientation was obtained via laser irradiation. The changes in the structure were analyzed by reflection high energy electron diffraction and by channeling effect technique using 2.0 MeV He Rutherford scattering. The power density required to induce the transition in a 4500 Å thick polycrystalline layer is about 70 MW/cm2 (50ns). The corresponding amorphous to single transition has a threshold of about 45 MW/cm2.
Similar content being viewed by others
References
G.A. Kachurin, N.B. Pridachin, L.S. Smirnov: Sov. Phys. Semicond.9, 946 (1976)
E.I. Shtyrkov, I.B. Khaibullin, M.M. Zaripov, M.F. Galyatuchinov, R.M. Bayazitov: Sov. Phys. Semicond.9, 1309 (1976)
A.Kh. Antonenko, N.N. Gerasimenko, A.V. Dvurechenskii, L.S. Smirnov, I.B. Tscitlin: Sov. Phys. Semicond.10, 81 (1976)
M.M. Zaripov, I.B. Khaybullin, E.I. Shtyrkov: Sov. Phys. Usp.19, 1032 (1976)
G. Foti, E. Rimini, G. Vitali, M. Bertolotti: Appl. Phys.14, 189 (1977)
G. Vitali, M. Bertolotti, G. Foti, E. Rimini: InAmorphous and Liquid Semiconductors, Proc. 7th Intern. Conf., Edinburgh 1977, ed. by W.E. Spear (University of Dundee, 1977) p. 24
G. Vitali, M. Bertolotti, G. Foti, E. Rimini: Phys. Lett.63A, 351 (1977)
G. Foti, E. Rimini, G. Vitali, M. Bertolotti: Proc. of the Symp. “Thin Film Phenomena-Interfaces and Interactions”, ed. by J.E. Baglin and J.M. Poate, (The Electrochemical Society, Princeton, N. J. 08540, 1978), vol. 78-2, pp. 88–98
M.H. Brodsky, R.S. Title, K. Weiser, G.D. Pettit: Phys. Rev. E1, 2632 (1970)
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Vitali, G., Bertolotti, M., Foti, G. et al. Laser induced single-crystal transition in polycrystalline silicon. Appl. Phys. 17, 111–113 (1978). https://doi.org/10.1007/BF00885039
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00885039