Abstract
Having developed a new method of differential lifetime measurement using atomic ionoluminescence as an excitation process, we applied this method to a monocrystaline silicon sample in an oxygen atmosphere of variable pressure. We found decreased values of the experimental lifetimes concerning levels 4s 3 P 0 and 4s 1 P 0, which are more marked when the oxygen pressure increases. This tends then towards a saturation of the observed phenomenon.
We propose, in agreement with other authors, an explanation which is based on the existence of non-radiative deexcitations. We present also a mathematical model for calculating this transition effect on the lifetime measurements. We consider that it is possible to take advantage of this experimental lifetime variation to determine a parameter of the model which characterises the non-radiative deexcitations. This measuring method appears to be a simple and original procedure for the study of certain nonradiative transitions.
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Azencot, J., Goutte, R. Study of non-radiative silicon deexcitation in an oxygen atmosphere using the differential measurement of the excited state lifetimes. Appl. Phys. 14, 303–311 (1977). https://doi.org/10.1007/BF00882736
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DOI: https://doi.org/10.1007/BF00882736