Literature cited
B. S. Danilin and V. Yu. Kireev, Application of Low-Temperature Plasma For Etching and Cleaning of Materials [in Russian], Énergoatomizdat, Moscow (1987).
E. I. Shushkov et al., Multichannel Pulse Counters [in Russian], Énergiya, Leningrad (1971).
M. Kimura, Jpn. J. Appl. Phys., No. 1, 105 (1984).
Ya. É. Tiberg and V. N. Paulauskas, Prib. Tekh. Éksp., No. 5, 183 (1980).
Additional information
Deceased.
Translated from Izmeritel'naya Tekhnika, No. 1, pp. 25–26, January, 1989.
Rights and permissions
About this article
Cite this article
Osadchuk, V.S., Sergienko, A.F., Revenok, V.I. et al. Apparatus for studying relaxation processes in a low-temperature plasma by the photon counting method. Meas Tech 32, 39–41 (1989). https://doi.org/10.1007/BF00863636
Issue Date:
DOI: https://doi.org/10.1007/BF00863636