Skip to main content
Log in

Apparatus for studying relaxation processes in a low-temperature plasma by the photon counting method

  • Published:
Measurement Techniques Aims and scope

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Literature cited

  1. B. S. Danilin and V. Yu. Kireev, Application of Low-Temperature Plasma For Etching and Cleaning of Materials [in Russian], Énergoatomizdat, Moscow (1987).

    Google Scholar 

  2. E. I. Shushkov et al., Multichannel Pulse Counters [in Russian], Énergiya, Leningrad (1971).

    Google Scholar 

  3. M. Kimura, Jpn. J. Appl. Phys., No. 1, 105 (1984).

    Google Scholar 

  4. Ya. É. Tiberg and V. N. Paulauskas, Prib. Tekh. Éksp., No. 5, 183 (1980).

    Google Scholar 

Download references

Authors

Additional information

Deceased.

Translated from Izmeritel'naya Tekhnika, No. 1, pp. 25–26, January, 1989.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Osadchuk, V.S., Sergienko, A.F., Revenok, V.I. et al. Apparatus for studying relaxation processes in a low-temperature plasma by the photon counting method. Meas Tech 32, 39–41 (1989). https://doi.org/10.1007/BF00863636

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00863636

Keywords

Navigation