Abstract
Features are examined for a high-frequency discharge between planar electrodes as widely used in plasma etching in microelectronics. Averaging in space and time over the fast electron motions enables one to simplify the discharge description considerably. The discharge can be analyzed for elevated pressures, when the electron distribution is determined by the instantaneous local electric field, by solving the equation of motion for the ions in the average fields. At low pressures, allowance must be made for the fact that the electron energy distribution is nonlocal. A simple kinetic equation is derived for that case. The effects of the nonlocality on the discharge parameters have been examined.
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Additional information
St. Petersburg Technical University. Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 62, No. 5, pp. 717–719, May, 1992.
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Smirnov, A.S., Tsendin, L.D. State of the art and applications of low-pressure hf discharge physics. J Eng Phys Thermophys 62, 512–514 (1992). https://doi.org/10.1007/BF00862335
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DOI: https://doi.org/10.1007/BF00862335