Investigation of the nature of the trifluoromethyl, trifluorosilyl, and trichlorosilyl groups in the series CF3CHXCXYSiF3 and CF3 CHXCXYSiCl3

  • A. V. Ignatenko
  • M. A. Kadina-Ignatenko
  • G. V. Frolova
  • A. D. Naumov
  • V. A. Ponomarenko
Physical Chemistry
  • 17 Downloads

Conclusions

  1. 1.

    The SiF3 group has a deactivating influence on the reactivity of the C-H and C-Cl bonds in theα-position to the silicon atom in radical and ionic reactions.

     
  2. 2.

    The values of the chemical shifts in the NMR-H1 spectra of the investigated compounds depend chiefly on the inductive effects of the substituents.

     
  3. 3.

    A pattern was detected in the changes in the chemical shifts of F19 as a function of the position of the chlorine atom and substituted trifluoropropyltrifluorosilanes and trifluoropropyltrichlorosilanes, due to alternation of the charge along the chain.

     

Keywords

Silicon Chlorine Chemical Shift Chlorine Atom Silicon Atom 

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Literature cited

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Copyright information

© Consultants Bureau 1972

Authors and Affiliations

  • A. V. Ignatenko
    • 1
  • M. A. Kadina-Ignatenko
    • 1
  • G. V. Frolova
    • 1
  • A. D. Naumov
    • 1
  • V. A. Ponomarenko
    • 1
  1. 1.N. D. Zelinskii Institute of Organic ChemistryAcademy of Sciences of the USSRUSSR

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