Investigation of the nature of the trifluoromethyl, trifluorosilyl, and trichlorosilyl groups in the series CF3CHXCXYSiF3 and CF3 CHXCXYSiCl3
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The SiF3 group has a deactivating influence on the reactivity of the C-H and C-Cl bonds in theα-position to the silicon atom in radical and ionic reactions.
The values of the chemical shifts in the NMR-H1 spectra of the investigated compounds depend chiefly on the inductive effects of the substituents.
A pattern was detected in the changes in the chemical shifts of F19 as a function of the position of the chlorine atom and substituted trifluoropropyltrifluorosilanes and trifluoropropyltrichlorosilanes, due to alternation of the charge along the chain.
KeywordsSilicon Chlorine Chemical Shift Chlorine Atom Silicon Atom
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