Investigation of the nature of the trifluoromethyl, trifluorosilyl, and trichlorosilyl groups in the series CF3CHXCXYSiF3 and CF3 CHXCXYSiCl3
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The SiF3 group has a deactivating influence on the reactivity of the C-H and C-Cl bonds in theα-position to the silicon atom in radical and ionic reactions.
The values of the chemical shifts in the NMR-H1 spectra of the investigated compounds depend chiefly on the inductive effects of the substituents.
A pattern was detected in the changes in the chemical shifts of F19 as a function of the position of the chlorine atom and substituted trifluoropropyltrifluorosilanes and trifluoropropyltrichlorosilanes, due to alternation of the charge along the chain.
KeywordsSilicon Chlorine Chemical Shift Chlorine Atom Silicon Atom
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- 1.V. F. Mironov and V. A. Ponomarenko, Izv. Akad. Nauk SSSR, Otd. Khim., 199 (1957).Google Scholar
- 2.A. L. Henne and J. B. Hinkamp, J. Amer. Chem. Soc.,67, 1197 (1945).Google Scholar
- 3.O. W. Steward and O. R. Pieree, J. Organometal. Chem.,4, 138 (1965).Google Scholar
- 4.J. Amsley, J. Finey, and L. Sutcliff, High-Resolution NMR Spectroscopy [Russian translation], Vol. 2, Mir (1969).Google Scholar
- 5.H. D. Sokolov, Uspekhi Khimii,36, 2195 (1967).Google Scholar
- 6.N. D. Sokolova and S. Ya. Umanskii, Teoret. i Éksperim. Khimiya,2, 171 (1966).Google Scholar
- 7.G. K. Semin, Dokl. Akad. Nauk SSSR,158, 1169 (1964).Google Scholar
- 8.R. N. Haszeldine, P. J. Robinson, and R. T. Simmons, J. Chem. Soc., B, 1357 (1967).Google Scholar