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Determination of temperature gradient in semiconductor wafer

  • Thermophysical Measurements
  • Published:
Measurement Techniques Aims and scope

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Literature cited

  1. W. G. Pfann, Zone Melting [Russian translation], Mir, Moscow (1970).

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  2. A. K. Kurnosov, in: Problems of Electronics, Series II. Semiconductor Devices [in Russian], 3 (1962).

  3. G. V. Dudko and S. I. Kartashov, Elektron. Obrab. Material., No. 3 (1969).

  4. V. P. Isachenko, V. A. Osipova, and A. S. Sukomel, Heat Transfer [in Russian], Énergiya, Moscow (1969).

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  5. G. L. Glassbrennert and G. A. Slak, Phys. Rev.,134, No. 44 (1964).

  6. V. F. Brekhovskikh, Tr. Mosk. Inst. Inzh. Zhelezn. Transp., No. 189, (1965).

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Authors
  1. G. V. Dudko
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  2. S. I. Kartashov
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Additional information

Translated from Izmeritel'naya Tekhnika, No. 12, pp. 45–46, December, 1976.

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Dudko, G.V., Kartashov, S.I. Determination of temperature gradient in semiconductor wafer. Meas Tech 19, 1754–1755 (1976). https://doi.org/10.1007/BF00828228

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  • DOI: https://doi.org/10.1007/BF00828228

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