Literature cited
Z. Jokuthy, Electrotechnika,60, No. 1 (1967).
R. Gland, J. Electrochem. Soc.,103, No. 4 (1956).
B. McDonald and A. Goetzberger, J. Electrochem. Soc.,109, No. 2 (1962).
D. R. Turner, J. Electrochem. Soc.,106, No. 8 (1959).
T. H. Yeh and A. E. Blakesley, J. Electrochem. Soc.,110, No. 9 (1963).
A. Joyce, Solid State Electronics,5, Nos. 3–4 (1962).
S. Metfessel', Thin Films, Their Preparation and Measurement [in Russian], GÉI, Moscow-Leningrad (1963).
A. V. Rakov, Spectrophotometry of Thin-Film Semiconductor Structures [in Russian], Sov. Radio, Moscow (1975).
M. P. Albert and J. F. Combs, J. Electrochem. Soc.,109, No. 8 (1962).
V. L. Levshin, Methods of Spectral Analysis [in Russian], MGU, Moscow (1962).
R. Hulton and C. Jones, J. Electrochem. Soc.,113, No. 5 (1966).
W. Dash, Appl. Phys.,33, No. 7 (1962).
Yu. E. Gordienko et al., “Measurement of the thickness of epitaxial films by a microwave method,” Elektron. Tekh. Uprav. Kachestvom i Standartizatsiya, No. 11, 22, Moscow TsNII, Élektronika.
Yu. E. Gordienko et al., Prib. Tekh. Eksp., No. 4 (1974).
E. M. Vorokova et al., Optical Materials for Infrared Technique [in Russian], Nauka, Moscow (1965).
E. G. Shramkov, Electrical Measurements [in Russian], Vysshaya Shkola, Moscow (1972).
L. Z. Rumshinskii, Mathematical Treatment of Experimental Results [in Russian], Nauka, Moscow (1971).
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Translated from Izmeritel'naya Tekhnika, No. 2, pp. 25–26, February, 1977.
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Stolyarov, S.I., Efremenko, A.G., Galuzo, A.A. et al. Instrument for measuring thickness of epitaxial layers. Meas Tech 20, 193–196 (1977). https://doi.org/10.1007/BF00824480
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DOI: https://doi.org/10.1007/BF00824480