Conclusions
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1.
A study has been made of the growth of epitaxial gallium arsenide films on planes having simple and complicated crystallographic indices over the substrate-orientation range (111)A-(100)-(111)B.
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2.
The tangential velocity of an isolated growth step and the diffusion length for adsorbed atoms on the (111)A, (111)B, and (100) planes have been determined.
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3.
The anisotropy in the growth rates of epitaxial films on various planes has been calculated; comparison shows a satisfactory agreement with experiment.
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W. K. Burton, N. Cabrera, and F. C. Frank, in: Elementary Crystal-Growth Processes [Russian translation], IL, Moscow (1959).
L. G. Lavrent'eva, M. P. Yakubenya, V. D. Dedkov, et al., in: Growth and Structure of Single-Crystal Films [in Russian], Izd. Nauka (1968).
L. N. Aleksandrov, E. A. Krivorotov, and Yu. G. Sidorov, in: Gallium Arsenide [in Russian], Vol. 3, Izd. TGU, Tomsk (1970).
A. A. Chernov and B. Ya. Lyubov, in: Crystal Growth [in Russian], Vol. 5, Izd. Nauka (1965).
N. Cabrera and R. W. Kahlman, in: Theory and Practice of Crystal Growth [Russian translation], Metallurgiya (1968), p. 9.
L. G. Lavrent'eva and Yu. G. Kataev, Izv. VUZ. Fiz., No. 11, 159 (1969).
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Translated from Izvestiya VUZ. Fizika, No. 3, pp. 69–75, March, 1970.
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Lavrent'eva, L.G., Yakubenya, M.P. & Moskovkin, V.A. Epitaxial gallium arsenide. Soviet Physics Journal 13, 331–336 (1970). https://doi.org/10.1007/BF00818320
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DOI: https://doi.org/10.1007/BF00818320