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Energetic anisotropy of chemically deposited nickel-cobalt and iron-nickel films

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Conclusions

  1. 1.

    Chemically deposited Ni-Co and Fe-Ni films bave a magnetic-anisotropy constant nearly an order of magnitude lower than that of films produced by thermal deposition [4, 5].

  2. 2.

    The treatment of the substrate surface greatly affects the magnetic properties of the films produced by chemical deposition.

  3. 3.

    The magnetic anisotropy caused by the directional polishing significantly increases the anisotropy caused by the magnetic field, regardless of whether this field is applied during the deposition or after it.

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Literature cited

  1. A. Brenner and G. Riddell, J. Research NBS,39, 385 (1947).

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  2. A. F. Schmeckenbecher, US Patent No. 3255033 (1966).

  3. K. K. Gorbunova and A. A. Nikiforova, Physicochemical Bases of Chemical Nickel-Plating [in Russian], Izd. Akad. Nauk SSSR, Moscow (1960).

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  4. I. W. Wolf, H. W. Katz, and A. E. Brain, Proceedings of the 1959 Electronic-Components Conference, Philadelphia, Pa., p. 15.

  5. R. J. Heritage and M. T. Walker, J. Elect. Cont.,7, 542 (1960).

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Author information

Authors and Affiliations

  1. Krasnoyarsk State Pedagogical Institute, USSR

    I. Ya. Ganzha, V. P. Ryabinin, S. Ya. Kiparisov, N. Ya. Maleev & V. S. Cherkashin

Authors
  1. I. Ya. Ganzha
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  2. V. P. Ryabinin
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  3. S. Ya. Kiparisov
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  4. N. Ya. Maleev
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  5. V. S. Cherkashin
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Additional information

Translated from Izvestiya VUZ. Fizika, No. 10, pp. 156–158, October, 1969.

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Ganzha, I.Y., Ryabinin, V.P., Kiparisov, S.Y. et al. Energetic anisotropy of chemically deposited nickel-cobalt and iron-nickel films. Soviet Physics Journal 12, 1368–1369 (1969). https://doi.org/10.1007/BF00815693

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  • DOI: https://doi.org/10.1007/BF00815693

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