Conclusions
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1.
Kiessig's method is an absolute method of measuring film thicknesses of 10–50 nm.
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2.
Measurement of a film thickness greater than 50 nm by Kiessig's method is related with difficulties due to the disappearance of the first maxima on the interference intensity reflection curve. To determine the thicknesses of such films it is necessary to conduct additional calibration with the use of other methods of analysis.
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3.
Kiessig's method can be used to measure the thicknesses of films of a complex chemical composition and of bilayer films if the outer film is less dense than the inner.
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4.
With an increase of the coefficient μ of the film material its maximum thickness, at which interference peaks can still be observed, decreases.
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Literature cited
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Additional information
Translated from Izmeritel'naya Tekhnika, No. 6, pp. 27–28, June, 1973.
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Malyukov, B.A., Korolev, V.E. Precision measurement of the thickness of thin films by Kiessig's method. Meas Tech 16, 833–835 (1973). https://doi.org/10.1007/BF00815021
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DOI: https://doi.org/10.1007/BF00815021