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Fractography of chemical vapour-deposited Si3 N4

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Abstract

The fractography of massive amorphous and crystalline chemical vapour-deposited silicon nitride (Pyrolytic-Si3 N4) prepared under various deposition conditions using SiCl4, NH3 and H2 as the source gases has been carried out at room temperature in order to clarify the relation between fracture surfaces and structural features. For amorphous Py-Si3 N4, three types of fracture surfaces are observed; i.e. (a) a clean contour-like fracture surface, (b) a contour-like fracture surface including black spots and (c) a cone boundary fracture surface. The fracture mode of the crystalline Py-Si3 N4 depends greatly on the microstructure. The fracture of fine-grained and low-density Py-Si3 N4 occurs intergranularly, probably due to the presence of the undetectable amorphous Py-Si3 N4 between grain boundaries, while the coarse-grained and high-density Py-Si3 N4 with preferred orientations shows transgranular fracture. The fracture surfaces of massive Py-Si3 N4 are made in comparison with those of the varieties of Si3 N4 and SiC.

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Authors and Affiliations

  1. The Research Institute for Iron, Steel and Other Metals, Tohoku University, 980, Sendai, Japan

    Koichi Niihara & Toshio Hirai

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  1. Koichi Niihara
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  2. Toshio Hirai
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Niihara, K., Hirai, T. Fractography of chemical vapour-deposited Si3 N4 . J Mater Sci 13, 2385–2393 (1978). https://doi.org/10.1007/BF00808053

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