Skip to main content
Log in

Electrical properties of ruthenium dioxide base thick films with additions of high-melting compounds

  • Published:
Soviet Powder Metallurgy and Metal Ceramics Aims and scope

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Literature cited

  1. A. I. Antonyan, M. D. Smolin, V. G. Grebenkina, et al., Variable Thick-Film Resistors [in Russian], Naukova Dumka, Kiev (1980).

    Google Scholar 

  2. M. P. Ansell, “Conduction processes in thick-film resistors,” J. Electrocomp. Sci. Technol.,3, No. 3, 131–140 (1976).

    Google Scholar 

  3. G. Pike and C. Seager, “Electrical properties and conduction mechanisms of Ru-based thick-film (cermet) resistors,” J. Appl. Phys.,48, No. 12, 5151–5159 (1977).

    Google Scholar 

  4. N. Mott and E. Davis, Electron Processes in Noncrystalline Substances (2 Vols.) [Russian translation], Mir, Moscow (1982).

    Google Scholar 

  5. D. K. Paul and S. S. Mitra, “Evaluation of Mott's parameters for hopping conduction in amorphous Ge, Si, and Ge-Si,” Phys. Rev. Lett.,31, No. 16, 1000–1003 (1973).

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Additional information

Translated from Poroshkovaya Metallurgiya, No. 11, pp. 79–83, November, 1990.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Grebenkina, V.G., Dyshel', D.E., Smolin, M.D. et al. Electrical properties of ruthenium dioxide base thick films with additions of high-melting compounds. Powder Metall Met Ceram 29, 923–927 (1990). https://doi.org/10.1007/BF00794030

Download citation

  • Received:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00794030

Keywords

Navigation