Conclusions
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1.
A study of the reactions of silicon nitride and oxynitride with acids, mixtures of acids, and alkali metal hydroxides (solutions and melts) has shown that silicon oxynitride is less stable as a chemical compound than silicon nitride.
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2.
In phosphoric acid, silicon oxynitride decomposes with the formation of the soluble silicyl metaphosphate and ammonium phosphates. On heating, the soluble silicyl metaphosphate is precipitated out of a phosphoric acid solution as a sparingly soluble compound of composition Si3(PO4)4. The addition of tripotassium phosphate to phosphoric acid accelerates the decomposition of silicon oxynitride.
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3.
A study was made of the reactions of silicon oxynitride and nitride with aqueous solutions of sodium hydroxide. It was established that 1% sodium hydroxide solution decomposes silicon oxynitride at a constant rate, but has no effect upon silicon nitride.
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Translated from Poroshkovaya Metallurgiya, No. 10 (154), pp. 38–43, October, 1975.
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Kopylova, V.P., Nazarchuk, T.N. Chemical stability of silicon nitride and oxynitride powders. Powder Metall Met Ceram 14, 812–816 (1975). https://doi.org/10.1007/BF00790816
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DOI: https://doi.org/10.1007/BF00790816