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A TPD study of H2 ON Ru/SiO2 and Ru-Cu/SiO2

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Abstract

In H2 TPD from Ru/SiO2, two desorption peaks were observed. Both exchanged H for D in sequential dosing experiments. These hydrogen adsorption states were also found for Ru-Cu/SiO2, along with another, higher temperature state at 400–500 K. This last state was neither exchangeable with nor replaceable by deuterium subsequently dosed at 150 K. The three chemisorption states are attributed to hydrogen held at the interface between Ru and SiO2 (< 300 K), adsorbed on Ru particles (310–380 K), and held at the Ru-Cu interface (> 400 K).

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Authors and Affiliations

  1. Center for Materials Chemistry, Department of Chemistry, The University of Texas at Austin, 78712, Austin, Texas, USA

    Tuo Jin, Sam K. Jo & J. M. White

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  1. Tuo Jin
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  2. Sam K. Jo
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  3. J. M. White
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Jin, T., Jo, S.K. & White, J.M. A TPD study of H2 ON Ru/SiO2 and Ru-Cu/SiO2 . Catal Lett 5, 217–227 (1990). https://doi.org/10.1007/BF00763956

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  • DOI: https://doi.org/10.1007/BF00763956

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