Microelectronic and medical applications of an ion beam milling system

Abstract

An ion beam milling system utilizing a Kaufman-type source to etch patterns in conductive, semiconductive and insulating materials was used to examine the surface morphology of resistive thick films, and to modify the surface topography of biomaterials. The ion beam sputter modification of the different materials presently used or under consideration for electronic and implant devices were studied. A Japan Electron Optics Laboratory, model JSM-35 scanning electron microscope was used to examine all the materials tested.