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General expression for the Hall coefficient of thin metal films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Laboratoire d'Electronique, Université de Nancy 1, B.P. 239, 54506, Vandoeuvre-les-Nancy, France

    C. R. Pichard & A. J. Tosser

  2. Laboratoire de Chronométrie et Piézoélectricité, La Bouloie, E.N.S.M.M., Route de Gray, 25030, Besancon, France

    C. R. Tellier

Authors
  1. C. R. Pichard
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  2. A. J. Tosser
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  3. C. R. Tellier
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Pichard, C.R., Tosser, A.J. & Tellier, C.R. General expression for the Hall coefficient of thin metal films. J Mater Sci Lett 1, 260–263 (1982). https://doi.org/10.1007/BF00727851

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  • DOI: https://doi.org/10.1007/BF00727851

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