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Oriented Pb5Ge3−x Si x O11 thick films prepared by the printing technique

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Muki-Zaishitsu Kenyu-Sho (National Institute for Research in Inorganic Materials), Namiki 1-1, Sakura-Mura, Niihari-Gun, 305, Ibaraki, Japan

    Koichiro Takahashi & Shin-Ichi Shirasaki

  2. Central Research Laboratory, Sumitomo Metal Mining Co. Ltd., Naka-Kokubu 3-18-5, Ichikawa-Shi, 272, Chiba, Japan

    Keiji Takamatsu, Nobuo Kobayashi & Yukuaki Mitarai

  3. Department of Industrial Chemistry, Faculty of Engineering, Chiba University, Yayoi-cho 1-33, 260, Chiba-Shi, Japan

    Kazuyuki Kakegawa

Authors
  1. Koichiro Takahashi
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  2. Shin-Ichi Shirasaki
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  3. Keiji Takamatsu
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  4. Nobuo Kobayashi
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  5. Yukuaki Mitarai
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  6. Kazuyuki Kakegawa
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Takahashi, K., Shirasaki, SI., Takamatsu, K. et al. Oriented Pb5Ge3−x Si x O11 thick films prepared by the printing technique. J Mater Sci Lett 3, 239–241 (1984). https://doi.org/10.1007/BF00726803

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  • DOI: https://doi.org/10.1007/BF00726803

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