References
T. TOHDA, K. WASA and S. HAYAKAWA,J. Electrochem. Soc. 127 (1980) 44.
A. GUIVARC'H, J. RICHARD, M. LE CONTELLEC, E. LIGEON and J. FONTENILLE,J. Appl. Phys. 51 (1980) 2167.
M. KATZ, D. ITZHAK, A. GRILL and R. AVNI,Thin Solid Films 72 (1980) 497.
A. SATHYAMOORTHY and W. WEISWEILER, ibid.87 (1982) 33.
T. NAGAI, K. YAMAMOTO and I. KOBAYASHI,J. Phys. E: Sci. Instrum. 15 (1982) 520.
A. MORIMOTO, T. MIURA, M. KUMEDA and T. SHIMIZU,Jpn. J. Appl. Phys. 21 (1982) L 119.
D. ANDERSON and W. SPEAR,Phil. Mag. 35 (1976) 1.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Boyer, A., Deschacht, D., Michel, J. et al. Transport in amorphous C x Si1−x alloys prepared by co-evaporation technique. J Mater Sci Lett 2, 357–359 (1983). https://doi.org/10.1007/BF00726329
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00726329