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SIMS profile analyses for Ge-, Co- and Fe-doped InP substrates used in epitaxial growth

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Journal of Materials Science Letters

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Authors and Affiliations

  1. RSRE, Malvern, Worcs, UK

    B. Cockayne, G. T. Brown & W. R. MacEwan

  2. AMTE, Holton Heath, Poole, Dorset, UK

    G. W. Blackmore

Authors
  1. B. Cockayne
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  2. G. T. Brown
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  3. W. R. MacEwan
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  4. G. W. Blackmore
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Cockayne, B., Brown, G.T., MacEwan, W.R. et al. SIMS profile analyses for Ge-, Co- and Fe-doped InP substrates used in epitaxial growth. J Mater Sci Lett 2, 309–313 (1983). https://doi.org/10.1007/BF00726316

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  • DOI: https://doi.org/10.1007/BF00726316

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