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Effect of solvent-washing on electrical resistivity of copper-phthalocyanine oligomer (tetramer)

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Journal of Materials Science Letters

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References

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Authors and Affiliations

  1. Department of Chemistry and Centre for Rural Development and Appropriate Technology, Indian Institute of Technology, 110016, New Delhi, India

    Hari Singh Nalwa & Padma Vasudevan

Authors
  1. Hari Singh Nalwa
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  2. Padma Vasudevan
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Nalwa, H.S., Vasudevan, P. Effect of solvent-washing on electrical resistivity of copper-phthalocyanine oligomer (tetramer). J Mater Sci Lett 2, 77–79 (1983). https://doi.org/10.1007/BF00725435

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  • DOI: https://doi.org/10.1007/BF00725435

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