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Expression of Hall coefficient of thin metal films in the presence of impurity effects

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Laboratoire d'Électronique, C.O. 140, Université de Nancy 1, 54037, Nancy, France

    C. R. Pichard & C. R. Tellier

  2. Laboratoire de Chronométrie et Piézoélectricité, La Bouloie, ENSMM, Route de Gray, 25030, Besançon, France

    A. J. Tosser

Authors
  1. C. R. Pichard
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  2. C. R. Tellier
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  3. A. J. Tosser
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Pichard, C.R., Tellier, C.R. & Tosser, A.J. Expression of Hall coefficient of thin metal films in the presence of impurity effects. J Mater Sci Lett 1, 423–425 (1982). https://doi.org/10.1007/BF00724860

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  • DOI: https://doi.org/10.1007/BF00724860

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