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High-temperature oxidation resistance and microstructure of the oxide films in silicon nitride ceramics

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Centro de Estudios e Investigaciones Técnicas (CEIT), PºManuel de Lardizábal, 15 (Bº de Ibaeta) Apartado 1.555, 20009, San Sebastian, Spain

    F. Castro, J. Echeberria & M. Fuentes

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  1. F. Castro
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  2. J. Echeberria
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  3. M. Fuentes
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Castro, F., Echeberria, J. & Fuentes, M. High-temperature oxidation resistance and microstructure of the oxide films in silicon nitride ceramics. J Mater Sci Lett 11, 101–105 (1992). https://doi.org/10.1007/BF00724612

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  • DOI: https://doi.org/10.1007/BF00724612

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