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Ellipsometric characterization of thin-film deoxidation of iron between 298 and 675 K

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Journal of Materials Science Letters

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References

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Author notes

  1. D. L. Johnson

    Present address: Department of Mechanical Engineering, Metallurgy Program, University of Nebraska-Lincoln, 68588, Lincoln, NE, USA

Authors and Affiliations

  1. Chun Shan Institute of Science and Technology, Lung-Tan, Taiwan

    R. H. Wan

  2. Department of Materials Engineering, Tatung Institute of Technology, 10451, Taipei, Taiwan

    D. L. Johnson

Authors
  1. R. H. Wan
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  2. D. L. Johnson
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Wan, R.H., Johnson, D.L. Ellipsometric characterization of thin-film deoxidation of iron between 298 and 675 K. J Mater Sci Lett 10, 553–555 (1991). https://doi.org/10.1007/BF00724434

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  • DOI: https://doi.org/10.1007/BF00724434

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