Journal of Materials Science Letters

, Volume 4, Issue 10, pp 1280–1281 | Cite as

Etch rate of low-temperature chemically vapour deposited SiO2 films in P-etch solution: the effect of deposition conditions

  • C. Pavelescu
  • C. Cobianu
  • E. Segal
Article

Keywords

Polymer SiO2 Deposition Condition SiO2 Film 

References

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Copyright information

© Chapman and Hall Ltd. 1985

Authors and Affiliations

  • C. Pavelescu
    • 1
  • C. Cobianu
    • 1
  • E. Segal
    • 2
  1. 1.MicroelectronicaBucharestRomania
  2. 2.Faculty of Chemical EngineeringPolytechnical Institute of BucharestBucharestRomania

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