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Journal of Materials Science Letters

, Volume 10, Issue 12, pp 703–705 | Cite as

Dry etching of low-temperature chemically vapour deposited phosphosilicate glass films in CF4-Q2 plasma

  • R. Bantoiu
  • C. Pavelescu
  • V. Avramescu
Article
  • 40 Downloads

Keywords

Polymer Glass Film Phosphosilicate Phosphosilicate Glass 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Chapman and Hall Ltd 1991

Authors and Affiliations

  • R. Bantoiu
    • 1
  • C. Pavelescu
    • 1
  • V. Avramescu
    • 1
  1. 1.R&D Center for Electronic Components (CCSIT-CE)BucharestRomania

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