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The use of ellipsometry measurements in process control during phosphorus-ion implantation of silicon

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Journal of Materials Science Letters

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References

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  3. G. CARTER and W. A. GRANT, “Ion Implantation of Semiconductors” (Edward Arnold, London, 1976) pp. 109–51.

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  1. Microelectronica-Bucharest, Str. Erou Iancu Nicolae 3414, 72996, Bucharest, Romania

    Radu Marinescu

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  1. Radu Marinescu
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Marinescu, R. The use of ellipsometry measurements in process control during phosphorus-ion implantation of silicon. J Mater Sci Lett 4, 1451–1453 (1985). https://doi.org/10.1007/BF00721361

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  • DOI: https://doi.org/10.1007/BF00721361

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