Journal of Materials Science Letters

, Volume 4, Issue 12, pp 1451–1453 | Cite as

The use of ellipsometry measurements in process control during phosphorus-ion implantation of silicon

  • Radu Marinescu


Polymer Silicon Process Control Ellipsometry Measurement 
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    J. D. HOEPFNER, in “Ion Implantation: Equipment and Techniques”, edited by H. Ryssel and H. Glawischnig (Springer, Berlin, New York, 1983) pp. 327–30.Google Scholar
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    J. F. GIBBONS, W. S. JOHNSON and S. W. MYLROIE, “Projected Range Statistics: Semiconductors and Related Materials”, 2nd Edn (Halsted, Stroudsbury, Pennsylvania, 1975).Google Scholar
  3. 3.
    G. CARTER and W. A. GRANT, “Ion Implantation of Semiconductors” (Edward Arnold, London, 1976) pp. 109–51.Google Scholar
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    E. A. IRENE and W. D. DONG,J. Electrochem. Soc. 129 (1982) 1347.Google Scholar

Copyright information

© Chapman and Hall Ltd. 1985

Authors and Affiliations

  • Radu Marinescu
    • 1
  1. 1.Microelectronica-BucharestBucharestRomania

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