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Journal of Materials Science Letters

, Volume 4, Issue 12, pp 1451–1453 | Cite as

The use of ellipsometry measurements in process control during phosphorus-ion implantation of silicon

  • Radu Marinescu
Article

Keywords

Polymer Silicon Process Control Ellipsometry Measurement 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    J. D. HOEPFNER, in “Ion Implantation: Equipment and Techniques”, edited by H. Ryssel and H. Glawischnig (Springer, Berlin, New York, 1983) pp. 327–30.Google Scholar
  2. 2.
    J. F. GIBBONS, W. S. JOHNSON and S. W. MYLROIE, “Projected Range Statistics: Semiconductors and Related Materials”, 2nd Edn (Halsted, Stroudsbury, Pennsylvania, 1975).Google Scholar
  3. 3.
    G. CARTER and W. A. GRANT, “Ion Implantation of Semiconductors” (Edward Arnold, London, 1976) pp. 109–51.Google Scholar
  4. 4.
    E. A. IRENE and W. D. DONG,J. Electrochem. Soc. 129 (1982) 1347.Google Scholar

Copyright information

© Chapman and Hall Ltd. 1985

Authors and Affiliations

  • Radu Marinescu
    • 1
  1. 1.Microelectronica-BucharestBucharestRomania

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