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Thermal and ion-beam-induced reactions in titanium thin films on boron phosphide (100)

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Materials Science and Engineering Department, Cornell University, 14853, Ithaca, NY, USA

    Jian Li & J. W. Mayer

  2. Electrotechnical Laboratory, 1-1-4 Umezono, Umezono, 305, Tsukuba, Ibaraki, Japan

    N. Kobayashi & Y. Kumashiro

  3. NTT Applied Electronics Laboratories, Nippon Telegraph and Telephone Corporation, 3-9-11, Midoricho, Musashinoshi, 180, Tokyo, Japan

    H. Kuwano

Authors
  1. Jian Li
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  2. J. W. Mayer
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  3. N. Kobayashi
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  4. Y. Kumashiro
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  5. H. Kuwano
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Li, J., Mayer, J.W., Kobayashi, N. et al. Thermal and ion-beam-induced reactions in titanium thin films on boron phosphide (100). J Mater Sci Lett 11, 29–32 (1992). https://doi.org/10.1007/BF00720772

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  • DOI: https://doi.org/10.1007/BF00720772

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