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Journal of Materials Science Letters

, Volume 8, Issue 1, pp 98–101 | Cite as

Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H

  • M. Touanen
  • F. Teyssandier
  • M. Ducarroir
Article

Keywords

Polymer Chemical Vapour Deposition Vapour Deposition Chemical Vapour Theoretical Approach 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman and Hall Ltd 1989

Authors and Affiliations

  • M. Touanen
    • 1
  • F. Teyssandier
    • 1
  • M. Ducarroir
    • 1
  1. 1.Institut de Science et de Génie, CNRSUniversité Avenue de VilleneuvePerpignon CedexFrance

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